References

1. D.M. Mattox, Fundamentals of Iron Plating, J. Vac. Sci. Technol., Vol 10, 1973, p 47

2. D.M. Mattox, Ion Plating, Chapter 13, Handbook of Plasma Processing Technology: Fundamentals, Etching, Deposition and Surface Interactions, S.M. Rossnagel, J.J. Cuomo, and W.D. Westwood, Noyes Publications, 1990

3. D.M. Mattox, Chapter 6, Deposition Processes for Films and Coatings, 2nd ed., R. Bunshah, Ed., in press

4. N.A.G. Ahmed, in Ion Plating Technology—Developments and Applications, John Wiley & Sons, 1987

5. W.D. Westwood, Calculations of Deposition Rates in Diode Sputtering Systems, J. Vac. Sci. Technol., Vol 15, 1978, p 1

6. R.E. Somekh, Thermalizing Collision Calculations, Vacuum, Vol 34, 1984, p 987

7. D.W. Hoffman, A Sputtering Wind, J. Vac. Sci. Technol. A, Vol 3 (No. 1), 1985, p 561

8. S.M. Rossnagel, Gas Density Reduction Effects in Magnetrons, J. Vac. Sci. Technol. A, Vol 6 (No. 1), 1988, p 19

9. A.N. Chester, Gas Pumping in Discharge Tubes, Phys. Rev., Vol 169 (No. 1), 1968, p 172

10. D.M. Mattox, Film Deposition using Accelerated Ions, Electrochem. Technol., Vol 2, 1964, p 295

11. D.M. Mattox, Discussion section, J. Electrochem. Soc, Vol 115 (No. 12), 1968, p 1255

12. D.M. Mattox, "Apparatus for Coating a Cathodically Based Substrate," U.S. Patent 3,329,601, 4 July 1967

13. S. Aisenberg and R.W. Chabot, Physics of Ion Plating and Ion Beam Deposition, J. Vac. Sci. Technol., Vol 10 (No. 1), 1973, p 104

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