References cited in this section

1. H. Randhawa and P.C. Johnson, A Review of Cathodic Arc Plasma Processing. Surf. Coat. Technol., Vol 31, 1987, p 308-318

2. D.M. Sanders, Vacuum Arc-Based Processing, Handbook of Plasma Processing Technology Fundamentals, Etching, Deposition, and Surface Interactions, S.M. Rossnagel, J.J. Cuomo, and W.D. Westwood, Ed., Noyes, 1990, p 419-446

3. D.M. Sanders, D.B. Boercker, and S. Falabella, Coating Technology Based on the Vacuum Arc--A Review, IEEE Trans. Plasma Sci., Vol 18 (No. 6), 1990, p 883-894

5. D.B. Boercker, S. Falabella, and D.M. Sanders, Plasma Transport in a New Cathodic Arc Ion Source-Theory And Experiment, Surf. Coat. Technol., Vol 53 (No. 3), 1992, p 239-242

6. I.I. Aksenov et al., Plasma Flux Motion in a Toroidal Plasma Guide, Plasma Phys. and Contrl. Fus., Vol 28 (No. 5), 1986

7. B.F. Coll et al., Diamond-Like Carbon Films Synthesized by Cathodic Arc Evaporation, Thin Solid Films, Vol 209 (No. 2), 1992, p 165-173

8. A.M. Dorodnov, Technical Applications of Plasma Accelerators, Sov. Phys.-Tech. Phys., Vol 23 (No. 9), 1978,p 1058-1065

9. R. Buhl, E. Moll, and H. Daxinger, Method and Apparatus for Evaporating Material Under Vacuum Using Both Arc Discharge and Electron Beam, U.S. Patent, 4,448,802, 1984

10. A.M. Dorodnov, N.P. Kozlov, and N.V. Reshetnikov, Characteristics of Arc Anodes with Forced or Radiative Cooling, High Temp., Vol 13 (No. 3), 1975, p 556-561

11. A.M. Dorodnov, A.N. Kuznetsov, and V.A. Petrosov, New Anode-Vapor Vacuum Arc with a Permanent Hollow Cathode, Sov. Tech. Phys. Lett., Vol 5 (No. 8), 1979, p 418-419

12. A.A. Derkach and V.A. Saenko, Source of Metal-Vapor Plasma with Axial Anode, Instrum. Exp. Tech., Vol 33 (No. 6), 1990, p 1421-1423

13. V.A. Saenko, Production of Plasma from Vapors of Solids, Instrum. Exp. Tech., Vol 33 (No. 4), 1990, p 174-176

14. H. Ehrich, Vacuum Arcs with Consumable Anodes and Their Application to Coating, Vak.-Tech., Vol 37 (No. 6), 1988, p 176-182

15. H. Ehrich, The Anodic Vacuum Arc. I. Basic Construction and Phenomenology, J. Vac. Sci. Technol., Vol A6 (No. 1), 1988, p 134-138

16. H. Ehrich et al., Plasma Deposition of Thin Films Utilizing the Anodic Vacuum Arc, IEEE Trans. Plasma Sci., Vol 18 (No. 6), 1990, p 895-903

17. V.A. Saenko, A.A. Derkach, and V.M. Poznikharenko, Discharge Chamber of Metal-ion Source, Instrum. Exp. Tech., Vol 33 (No. 4), 1990, p 910-912

18. M. Mausbach, H. Ehrich, and K.G. Muller, Cu and Zn Films Produced with an Anodic Vacuum Arc, Vacuum, Vol 41 (No. 4-6), 1990, p 1393-1395

19. P.J. Martin, R.P. Netterfield, and T.J. Kinder, Ion-Beam-Deposited Films Produced by Filtered Arc Evaporation, Thin Solid Films, Vol 193 (No. 1-2), 1990, p 77-83

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