References cited in this section

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43. H.P.W. Hey, B.G. Sluijk, and D.G. Hemmes, Ion Bombardment: A Determining Factor in Plasma CVD, Solid State Technol., Vol 33 (No. 4), 1990, p 139

74. W.D. Sproul, P.J. Rudnik, K.O. Legg, W.-D. Munz, J. Petrov, and J.E. Greene, Reactive Sputtering in the ABS System, Surf Coat. Technol., Vol 56, 1993, p 179

81. D.L. Chambers and D.C. Carmichael, Development of Processing Parameters and Electron-Beam Techniques for Ion Plating, Society of Vacuum Coaters 14th Ann. Tech. Conf. Proc., 1971, p 13

82. J. Vyskocil, Cathodic Arc Evaporation in Thin Film Technology, J. Vac. Sci. Technol., Vol 10 (No. 4), 1992, p 1740

83. J. Celis, J.R. Roos, E. Vancoille, S. Boelens, and J. Ebbering, Ternary (Ti,Al)N and (Ti,Nb)N Coatings Produced by Steered Arc Ion Plating, Met. Finish., Vol 9 (No. 4), 1993, p 19

84. D. Sanders, Vacuum Arc-Based Processing, Chapter 18, Handbook of Plasma Processing Technology: Fundamentals, Etching, Deposition and Surface Interactions, S.M. Rossnagel, J.J. Cuomo, and W.D. Westwood, Ed., Noyes Publications, 1990

85. H. Ehrich, B. Hasse, M. Mausbach, and K.G. Muller, The Anodic Vacuum Arc and Its Application to Coating, J. Vac. Sci. Technol. A, Vol 8 (No. 3), 1990, p 2160

86. H. Ehrich, B. Hasse, M. Mausbach, and K.G. Muller, Plasma Deposition of Thin Films Utilizing the Anodic Vacuum Arc, IEEE Trans. Plas. Sci., Vol 18 (No. 6), 1990, p 895

87. W.D. Munz, F.J.M. Hauser, D. Schulze, and B. Buil, A New Concept for Physical Vapor Deposition Coating Combining the Methods of Arc Evaporation and Unbalanced-Magnetron Sputtering, Surf. Coat. Technol., Vol 49, 1991, p 161

88. W.D. Sproul, Surf Coat. Technol., Vol 49, 1991, p 284

89. R. Culbertson and D.M. Mattox, 8th Conf. Tube Technology, Institute of Electrical and Electronics Engineers, 1966, p 101-107

90. T. Mori and Y. Namba, Hard Diamondlike Carbon Films Deposited by Ionized Deposition of Methane Gas, J. Vac. Sci. Technol. A, Vol 1, 1983, p 23

91. S. Shanfield and R. Wolfson, Ion Beam Synthesis of Cubic Boron Nitride, J. Vac. Sci. Technol. A, Vol 1 (No. 2), 1983, p 323

92. F. Jansen, D. Kuhman, and C. Taber, Plasma Enhanced Chemical Vapor Deposition using Forced Flow through Hollow Cathodes, J. Vac. Sci. Technol. A, Vol 7 (No. 6), 1989, p 3176

93. J. Cheung and J. Horwitz, Pulsed Laser Deposition History and Laser-Target Interactions, MRS Bull., Vol 17 (No. 2), 1992, p 30 (this issue is devoted to laser deposition)

94. F. Davanloo, E.M. Juengerman, D.R. Jander, T.J. Lee, and C.B. Collins, Laser Plasma Diamond, J. Mater. Res., Vol 5 (No. 11), 1990, p 2394

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