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The IBAD process is a hybrid of PVD and ion implantation. It combines the advantages of both techniques, while eliminating most of the disadvantages of each. Table 4 lists the advantages and limitations of IBAD.

Table 4 Advantages and limitations of ion-beam-assisted deposition

Advantages, achievable benefits

Low deposition temperature

High adhesion

Bulk density achievable

Control of microstructure (nanocrystalline; metastable crystalline or amorphous; textured; and epitaxial, for some materials)


Precise modulation of composition with depth

Highly versatile for metals, ceramics, semiconductors, dielectrics


Moderately higher cost than physical vapor deposition

Line-of-sight processing

Technology in commercial infancy (limited vendors)

Even polymers with low melting points can be coated, because the deposition temperature can be maintained between room temperature and nearly 100 °C (210 °F). The properties of adhesion, stress, and density are superior to those of PVD films, and there is a high degree of control over the microstructure. Depending on the deposition parameters, films can be deposited as:

• Nanocrystalline

• Textured crystalline or epitaxial (for some materials)

• Metastable crystalline

Finally, the composition, or crystalline phases, can be precisely modulated as a function of thickness to produce functionally gradient materials with properties such as graded hardness, coefficient of thermal expansion, refractive index, density, tensile strength, and stress.

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