References cited in this section

94. E. Ritter, Deposition of Oxide Films by Reactive Evaporation, J. Vac. Sci. Technol., Vol 3, 1966, p 225

95. L. Holland, Substrate Treatment and Film Deposition in Ionized and Reactive Gases (Invited review), Thin Solid Films, Vol 27, 1975, p 185

96. Martin, R.P. Netterfield, and W.G. Sainty, Optical Properties of TiNx Produced by Reactive Evaporation and Reactive Ion Beam Sputtering, Vacuum, Vol 32, 1982, p 359

97. W. Heitmann, Reactive Evaporation in Ionized Gases, Appl. Opt., Vol 10, 1971, p 2414

98. R.F. Bunshah and A.C. Raghurm, Activated Reactive Evaporation Process for High Rate Deposition of Compounds, J. Vac. Sci. Technol., Vol 9, 1972, p 1385

99. C.V. Deshpandey and R.F. Bunshah, The Activated Reactive Evaporation (ARE) Process, Chapter 15, Handbook of Plasma Processing Technology Fundamentals, Etching, Deposition and Surface Interactions, S.M. Rossnagel, J.J. Cuomo, and W.D. Westwood, Ed., Noyes Publications, 1990

100. R.F. Bunshah and C. Deshpandey, The Activated Reactive Evaporation Process, Physics of Thin Films, Vol 13, 1987, p 59

101. R.J. Greiggs and W.D. Cornelius, Titanium Nitridation of Metallic Surfaces, J. Vac. Sci. Technol. A, Vol 7 (No. 3), 1989, p 2515

102. K.L. Chopra, V. Agarwal, V.D. Vankar, C.V. Deshpandey, and R.F. Bunshah, Synthesis of Cubic Boron Films by Reactive Evaporation of H3BO3, Thin Solid Films, Vol 126, 1985, p 307

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