References cited in this section

9. V. Ruth and J.P. Hirth, The Angular Distribution of Vapor from a Knudsen Cell, Condensation and Evaporation of Solids, E. Ruthner, P. Goldfinger, and J.P. Hirth, Ed., 1964, p 99

103. P. Chow, Molecular Beam Epitaxy, Chapter II-3, Thin Films Processes II, J.L. Vossen and W. Kern, Ed., Academic Press

104. L.M. Fraas, P.S. McLeod, L.D. Partain, and J.A. Cape, Epitaxial Growth from Organometallic Sources in High Vacuum, J. Vac. Sci. Technol. B, Vol 4, 1986, p 22

105. T. Takagi, Ionized-Cluster Beam Deposition and Epitaxy, Noyes Publications, 1988

106. I. Yamada, Ionized Cluster Beam (ICB) Deposition Techniques, Chapter 14, Handbook of Plasma Processing Technology: Fundamentals, Etching, Deposition and Surface Interactions, S.M. Rossnagel, J.J. Cuomo, and W.D. Westwood, Ed., Noyes Publications, 1990, p 356

107. F.K. Urban and A. Bernstein, Formation of Gold Clusters in Ionized Cluster Beam Deposition Technique, Thin Solid Films, Vol 193/194, 1990, p 92

108. F.K. Urban, Effects of Space Charge on Ion Energy in Ionized Cluster Beam Film Deposition Technique, Paper TF-WeP11 in 38th National AVS Symp., to be published in J. Vac. Sci. Technol.

109. W. Knauer, Formation of Large Metal Clusters by Surface Nucleation, J. Appl. Phys., Vol 62, 1987, p 841

110. J.M.E. Harper, Ion Beam Deposition, Chapter II-4, Thin Film Processes, J.L. Vossen and W. Kern, Academic Press, 1978

111. J.J. Schmitt, "Method and Apparatus for the Deposition of Solid Films of Material from a Jet Stream Entraining the Gaseous Phase of Said Material," U.S. Patent No. 4,788,082, 29 Nov 1988

112. B.L. Halpern, J.J. Schnidtt, J.W. Golz, Y. Di, and D.L. Johnson, Gas Jet Deposition of Thin Films, Appl. Surf. Sci., Vol 48/49, 1991, p 19

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