References cited in this section

7. E. Rutner, Some Limitations on the Use of the Langmuir and Knudsen Techniques for Determining

Kinetics of Evaporation, Condensation and Evaporation of Solids, E. Ruthner, P. Goldfinger, and J.P. Hirth, Ed., 1964, p 149

133. K. Miyoshi, T. Spalvins, and D.H. Buckley, Metallic Glass as a Temperature Sensor During Ion Plating, Thin Solid Films, Vol 127, 1975, p 115

134. A.R. Knoll, L.J. Matienzo, and K.J. Blackwell, Calibration of a Quartz Crystal Microbalance Deposition Rate Monitor by Spectroscopic Techniques, Society of Vacuum Coaters 34th Ann. Tech. Conf. Proc., 1991, p 247

135. H. Schwartz, Method of Measuring and Controlling Evaporation Rates During the Production of Thin Films in Vacuum, Trans. 7th Ann. AVSSymp., 1961, p 326

136. W.P. Thoeni, Deposition of Optical Coatings: Process Control and Automation, Thin Solid Films, Vol 88, 1982, p 385

137. F. Meyer, In Situ Deposition Monitoring, J. Vac. Sci. Technol. A, Vol 7 (No. 3), 1989, p 1432

138. J.L. Provo, Film-Thickness Resistance Monitor for Dynamic Control of Vacuum-Deposited Films, J. Vac. Sci. Technol, Vol 12 (No. 4), 1975, p 946

139. P.H. Wojciechowski, Stress Modification of Ni-Fe Films by Ion Bombardment Concurrent with Film Growth by Alloy Evaporation, J. Vac. Sci. Technol. A, Vol 6 (No. 3), 1988, p 1924

140. B.M. Clemens and J.A. Bain, Stress Determination in Textured Thin Films Using X-ray Diffraction, MRS Bull., Vol 17 (No. 7), 1992, p 46

Sputter Deposition

S.L. Rohde, University of Nebraska-Lincoln

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