References cited in this section

3. L.I. Maissel, The Deposition of Thin Films by Cathode Sputtering, Physics of Thin Films, G. Hass and R.E. Thun, Ed., Vol 3, Academic Press, 1966, p 61-127

4. G.K. Wehner, Sputtering by Ion Bombardment, Advances in Electronics and Electron Physics, Vol 7, Academic Press, 1955, p 239-298

5. C.R. Weissmantel, Deposition of Metastable Films by Ion Beam and Plasma Techniques, Proc. 9th Int. Vacuum Congress and 5th Int. Conf. on Solid Surfaces (Madrid), 26 Sept-1 Oct 1983, p 229-308

6. J.L. Vossen and W. Kern, Ed., Thin Film Processes, Academic Press, 1978

7. L.I. Maissel and R. Glang, Ed., Handbook of Thin Film Technology, McGraw-Hill, 1970

8. R.F. Bunshah, J.M. Blocher, T.D. Bonifield, J.G. Fish, P.B. Ghate, B E. Jacobson, DM. Mattox, G.E. McGuire, M. Schwartz, J.A. Thornton, and R.C. Tucker, Deposition Technologies for Thin Films and Coatings, Noyes Publications, 1982

9. R.W. Berry, P.M. Hall, and M.F. Harris, Thin Film Technology, Van Nostrand, 1968

10. J.J. Cuomo, S.M. Rossnagel, and H.R. Kaufman, Ed., Handbook of Ion Beam Processes, Noyes Publications, 1989

11. S.M. Rossnagel, J.J. Cuomo, and W.D. Westwood, Ed., Handbook of Plasma Processing Technology, Noyes Publications, 1990

12. W.D. Westwood, Calculation of Deposition Rates in Diode Sputtering Systems, J. Vac. Sci. Technol., Vol 15 (No. 1), 1978, p 1-9

13. J.A. Thornton, Influence of Apparatus Geometry and Deposition Conditions on the Structure and Topography of Thick Sputtered Coatings, J. Vac. Sci. Technol., Vol 11 (No. 4), 1974, p 666-670

14. R. Messier, A.P. Giri, and R.A. Roy, Revised Structure Zone Model for Thin Film Physical Structure, J. Vac. Sci. Technol. A, Vol 2 (No. 2), 1984, p 500-503

15. D M. Mattox, Fundamentals of Ion Plating, J. Vac. Sci. Technol., Vol 10 (No. 1), 1973, p 47-52

16. D.M. Mattox and G.J. Kominiak, Structure Modification by Ion Bombardment, J. Vac. Sci. Technol., Vol 9 (No. 1), 1972, p 528-532

32. J.L. Vossen and J.J. Cuomo, Glow Discharge Sputter Deposition, Thin Film Processes, J.L. Vossen and W. Kern, Ed., Academic Press, 1978, p 12-73

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