CHEMICAL VAPOR DEPOSITION (CVD) is a versatile process that can be used to deposit layers of nearly any metal, as well as nonmetallic elements, such as carbon and silicon (Ref 1). Compounds such as carbides, nitrides, oxides, intermetallics, and many others also can be deposited. This technology has become very important in these applications:

• Semiconductor and other electronic component manufacturing processes

• Coatings on tools, bearings, and other wear-resistant parts

• Optical, opto-electronic, and corrosion-resisting products

• Monolithic parts, ultrafine powders, and high-strength fibers

This article emphasizes the CVD of hard, tribological, and high-temperature coatings, as well as free-standing structures.


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