CH3SiCl3 SiC 3HCl

The reaction temperature ranges from 900 to 1400 °C (1650 to 2550 °F), and pressure ranges from 1.3 to 6.7 kPa (10 to 50 torr) in a hydrogen atmosphere. The deposition rate and the crystallite size increase with the increasing partial pressure of MTS. Other precursor combinations are SiCl4/CH4, SiCl4/CCl4, SiH2Cl2/C3H8, and SiHCl3/C3H8, usually in a hydrogen atmosphere.

Titanium carbide (Ref 33) is of major industrial importance in the coating of wear-resistant tools by the CVD process. The most common deposition system is the reaction of the metal chloride with a hydrocarbon:

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